Application of a semiconductor oxide-based catalyst in heterogeneous wastewater treatment: A green technology approach

Collin Glen Joseph Anthony Joseph , and Liew, Sharain Yen Ling and Krishnaiah, Duduku and Awang Bono, (2012) Application of a semiconductor oxide-based catalyst in heterogeneous wastewater treatment: A green technology approach. Journal of Applied Sciences, 12 (18). pp. 1966-1971. ISSN 1812-5654

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Official URL: http://dx.doi.org/10.3923/jas.2012.1966.1971

Abstract

The use of chlorine bleaching in study and pulp industry has resulted in chlorinated phenol contaminated wastewater from that industry. A new wastewater treatment process, sonophotodegradation of 2,4,6-trichlorophenol (TCP) in a heterogeneous aqueous system was investigated and reported in this study. TCP was degraded with ultrasonic or ultraviolet irradiation or a combination of both, in the presence of titanium dioxide semiconductor catalyst (anatase and/or rutile), in order to study the effectiveness of sonocatalysis, photocatalysis and sonophotocatalysis oxidation in a batch sonophotoreactor system. Preliminary studies presented in this study suggested that rutile worked well under sonocatalysis, anatase was the preference for photocatalysis and sonophotocatalysis benefited from a combined rutile and anatase mixture catalyst. Sonophotocatalysis oxidation of TCP demonstrated a degradation that was higher than sonocatalysis or photocatalysis individually while the first-order kinetics rate constants indicated that sonophotocatalysis degradation of TCP was synergistic with a positive value of 0.0203 in the presence of the mixture catalyst.

Item Type:Article
Uncontrolled Keywords:Anatase, Chlorophenol, Photocatalysis, Rutile, Sonocatalysis, Sonophotocatalysis, Sonophotodegradation, Chlorophenols, Rutile, Sonocatalysis, Sonophotocatalysis, Sonophotodegradation, Catalysts, Chlorine, Degradation, Oxide minerals, Phenols, Photocatalysis, Rate constants, Titanium dioxide
Subjects:?? TD429.5-480.7 ??
Divisions:SCHOOL > School of Science and Technology
ID Code:5100
Deposited By:IR Admin
Deposited On:12 Nov 2012 17:12
Last Modified:18 Feb 2015 15:13

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