Structural and Optical Properties of ZnO and MgZnO Semiconductor Materials at Different Annealing Temperature

M. Duinong and F. P. Chee and I. Haipa and J. H. W. Chang and A. Alias and Saafie Salleh and K. A. M. Salleh (2020) Structural and Optical Properties of ZnO and MgZnO Semiconductor Materials at Different Annealing Temperature. ASM Sc. J, 13. pp. 1-7.

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Abstract

Zinc Oxide (ZnO) and Magnesium Zinc Oxide (MgZnO) had received much attention in photoelectronic devices. The current study is performed to investigate the effect of temperature on the structural and optical properties of ZnO and MgZnO with 99.99% purity, deposited on Indium Tin Oxide (ITO) glass using Radio Frequency (RF) magnetron sputtering technique. The Argon flow into the chamber is 10 sccm with a deposition rate of 0.25± 0.1 kA/s, working pressure 4.5 x 10-3 Torr, gas and RF power of 100 watt. Structural analysis using X-Ray Diffraction (XRD) shows that when the temperature increase, the diffraction peak intensity and grain size increase while the deposition time at 30 minutes shows the best intensity. The grain size of ZnO and MgZnO is 0.362 nm and 0.195 nm at 300o C respectively. This shows that the full width half maximum (FWHM) of ZnO is smaller compared to MgZnO. The optical transparency value from UV-Vis spectrophotometer is 78% for ZnO while MgZnO showing 80%. This shows that optical transmittance of MgZnO is slightly higher than ZnO.

Item Type: Article
Keyword: zinc oxide, magnesium zinc oxide, optical properties, structural properties, radio frequency sputtering
Subjects: Q Science > Q Science (General)
Department: FACULTY > Faculty of Science and Natural Resources
Depositing User: SITI AZIZAH BINTI IDRIS -
Date Deposited: 18 Jan 2021 15:40
Last Modified: 18 Jan 2021 15:40
URI: https://eprints.ums.edu.my/id/eprint/26660

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