The preferred growth orientation of Ti thin film on MgO(100) substrate

Jun Yang and Saturi Baco and Yongzhong Jin and Yi Shu and Yong Fang and Pak Yan Moh (2023) The preferred growth orientation of Ti thin film on MgO(100) substrate. Frontiers in Materials, 10. pp. 1-8. ISSN 2296-8016

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Abstract

Understanding the preferred growth orientation of metal films is of great significance for optimizing film properties and preparing films with special structures. However, early works mainly focused on the preferred growth orientations of FCC and BCC metal films, the preferred growth orientation of HCP metal films and its formation mechanism are unclear. In this work, Ti film was deposited on MgO(100) substrate by magnetron sputtering at 523 K. The preferred growth orientation of Ti film and its formation mechanism were studied by experiment and first-principles calculation. XRD results found the preferred growth orientations of Ti film on MgO(100) substrate were Ti(001), Ti(100), and Ti(101), with Ti(001) being the most favored. First-principles calculation results showed the preferred growth orientation of the Ti film on the MgO(100) substrate was determined by a combination of interface separation work and lattice strain.

Item Type:	Article
Keyword:	Growth orientation, Ti/MgO(100), interface separation work, lattice strain, first-principles calculation
Subjects:	H Social Sciences > HD Industries. Land use. Labor > HD28-9999 Industries. Land use. Labor > HD2321-4730.9 Industry > HD2340.8-2346.5 Small and medium-sized businesses, artisans, handicrafts, trades Q Science > QD Chemistry > QD1-999 Chemistry > QD1-65 General Including alchemy
Department:	FACULTY > Faculty of Science and Natural Resources
Depositing User:	ABDULLAH BIN SABUDIN -
Date Deposited:	08 Feb 2024 16:18
Last Modified:	08 Feb 2024 16:18
URI:	https://eprints.ums.edu.my/id/eprint/38179

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