Nurmin Bolong and Ismail Saad and Z. Hamzah and B. Seng and K. Anuar and Bablu K. Ghosh and Razhwan Ismail (2014) Mitigating breakdown voltage with dual channel Vertical Strained SiGe Impact Ionization MOSFET (VESIMOS).
|
Text
Mitigating_breakdown_voltage_with_dual_channel_Vertical_Strained_SiGe_Impact_Ionization_MOSFET.pdf Download (49kB) | Preview |
Abstract
The Single and Dual Strained SiGe layer for Vertical Strained Silicon Germanium (SiGe) Impact Ionization MOSFET (VESIMOS) have been successfully analyzed in this paper. It is found that drain current for single (SC) and dual channel (DC) VESIMOS were increased sharply initially due to the presence of Germanium. Germanium has high impact ionization rates to ensure that the transition from OFF state to ON state is abrupt. However, breakdown voltage of the SC device was decreased from BV = 2.9V to 2.5V by increasing the composition of Ge from 10% to 30%. The same characteristics were found for DC VESIMOS where BV = 2V had decreased to 1.6V by varying the Ge composition. In short, the breakdown voltage which affected by the appearance of second SiGe channel and Ge composition was justified. Apart from that, with the presence of second SiGe channel, the switching speed and ION/IOFF of the device were improved. It was found that the sub-threshold slope of SC and DC VESIMOS were inversely proportional to the breakdown voltage. Hence, DC VESIMOS can be promoted as extraordinary candidate for low power nanoelectronics device.
| Item Type: | Article |
|---|---|
| Keyword: | Vertical Strained Silicon Germanium (SiGe),Impact Ionization MOSFET (VESIMOS) |
| Subjects: | T Technology > TK Electrical engineering. Electronics Nuclear engineering |
| Department: | FACULTY > Faculty of Engineering |
| Depositing User: | ADMIN ADMIN |
| Date Deposited: | 08 Apr 2016 11:06 |
| Last Modified: | 16 Oct 2017 15:14 |
| URI: | https://eprints.ums.edu.my/id/eprint/12790 |
Actions (login required)
 |
View Item |